Photoelectrochemical applications of electrochemical deposition of Ni2+-doped FeS2 thin films.
Prabukanthan, P.; Sreedhar, M.; Thamaraiselvi, S.; Harichandran, G.; Seenuvasakumaran, P.; Hanafiah, Marlia M.; Fernandez, Carlos
Marlia M. Hanafiah
Different concentration (1–5 mol%) of Ni2+-doped FeS2 thin films were deposited by facile ECD technique. XRD pattern Ni2+ ion-doped FeS2 thin films were cubic structure with the high intensity plane (2 0 0). HRSEM images show that the undoped with 1–2 mol% Ni2+-doped FeS2 thin films were spherical-like morphology with aggregated grains. 3 mol% Ni2+-doped FeS2 thin film was aggregated with smaller size grains. Electrochemical impedance analysis reveals that the minimum charge transfer resistance (69 Ω) is obtained for 3 mol% Ni2+ ion-doped FeS2 thin films with exceptional conductivity character compared to other samples. Photoelectrochemical test indicates that 3 mol% Ni2+ ion-doped FeS2 thin film generates enhanced photocurrent response and faster immigration of photoinduced charge carriers compared to the other samples. It has been observed from CV analysis; the optimized 3 mol% Ni2+-doped FeS2 thin film delivers superior electrocatalytic performance of triiodide reduction.
PRABUKANTHAN, P., SREEDHAR, M., THAMARAISELVI, S., HARICHANDRAN, G., SEENUVASAKUMARAN, P., HANAFIAH, M.M. and FERNANDEZ, C. . Photoelectrochemical applications of electrochemical deposition of Ni2+-doped FeS2 thin films. Journal of materials science: materials in electronics [online], Online First. Available from: https://doi.org/10.1007/s10854-021-05350-6
|Journal Article Type||Article|
|Acceptance Date||Jan 15, 2021|
|Online Publication Date||Feb 4, 2021|
|Deposit Date||Feb 18, 2021|
|Publicly Available Date||Feb 5, 2022|
|Journal||Journal of Materials Science: Materials in Electronics|
|Peer Reviewed||Peer Reviewed|
|Keywords||Photoelectrochemical; ECD technique; Ion-doped; Thin film|
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