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Photoelectrochemical applications of electrochemical deposition of Ni2+-doped FeS2 thin films.

Prabukanthan, P.; Sreedhar, M.; Thamaraiselvi, S.; Harichandran, G.; Seenuvasakumaran, P.; Hanafiah, Marlia M.; Fernandez, Carlos

Authors

P. Prabukanthan

M. Sreedhar

S. Thamaraiselvi

G. Harichandran

P. Seenuvasakumaran

Marlia M. Hanafiah

Carlos Fernandez



Abstract

Different concentration (1–5 mol%) of Ni2+-doped FeS2 thin films were deposited by facile ECD technique. XRD pattern Ni2+ ion-doped FeS2 thin films were cubic structure with the high intensity plane (2 0 0). HRSEM images show that the undoped with 1–2 mol% Ni2+-doped FeS2 thin films were spherical-like morphology with aggregated grains. 3 mol% Ni2+-doped FeS2 thin film was aggregated with smaller size grains. Electrochemical impedance analysis reveals that the minimum charge transfer resistance (69 Ω) is obtained for 3 mol% Ni2+ ion-doped FeS2 thin films with exceptional conductivity character compared to other samples. Photoelectrochemical test indicates that 3 mol% Ni2+ ion-doped FeS2 thin film generates enhanced photocurrent response and faster immigration of photoinduced charge carriers compared to the other samples. It has been observed from CV analysis; the optimized 3 mol% Ni2+-doped FeS2 thin film delivers superior electrocatalytic performance of triiodide reduction.

Citation

PRABUKANTHAN, P., SREEDHAR, M., THAMARAISELVI, S., HARICHANDRAN, G., SEENUVASAKUMARAN, P., HANAFIAH, M.M. and FERNANDEZ, C. [2021]. Photoelectrochemical applications of electrochemical deposition of Ni2+-doped FeS2 thin films. Journal of materials science: materials in electronics [online], Online First. Available from: https://doi.org/10.1007/s10854-021-05350-6

Journal Article Type Article
Acceptance Date Jan 15, 2021
Online Publication Date Feb 4, 2021
Deposit Date Feb 18, 2021
Publicly Available Date Feb 5, 2022
Journal Journal of Materials Science: Materials in Electronics
Print ISSN 0957-4522
Electronic ISSN 1573-482X
Publisher Springer
Peer Reviewed Peer Reviewed
DOI https://doi.org/10.1007/s10854-021-05350-6
Keywords Photoelectrochemical; ECD technique; Ion-doped; Thin film
Public URL https://rgu-repository.worktribe.com/output/1205728