Photoelectrochemical applications of electrochemical deposition of Ni2+-doped FeS2 thin films.

Prabukanthan, P.; Sreedhar, M.; Thamaraiselvi, S.; Harichandran, G.; Seenuvasakumaran, P.; Hanafiah, Marlia M.; Fernandez, Carlos

Abstract

Different concentration (1–5 mol%) of Ni2+-doped FeS2 thin films were deposited by facile ECD technique. XRD pattern Ni2+ ion-doped FeS2 thin films were cubic structure with the high intensity plane (2 0 0). HRSEM images show that the undoped with 1–2 mol% Ni2+-doped FeS2 thin films were spherical-like morphology with aggregated grains. 3 mol% Ni2+-doped FeS2 thin film was aggregated with smaller size grains. Electrochemical impedance analysis reveals that the minimum charge transfer resistance (69 Ω) is obtained for 3 mol% Ni2+ ion-doped FeS2 thin films with exceptional conductivity character compared to other samples. Photoelectrochemical test indicates that 3 mol% Ni2+ ion-doped FeS2 thin film generates enhanced photocurrent response and faster immigration of photoinduced charge carriers compared to the other samples. It has been observed from CV analysis; the optimized 3 mol% Ni2+-doped FeS2 thin film delivers superior electrocatalytic performance of triiodide reduction.

Citation

PRABUKANTHAN, P., SREEDHAR, M., THAMARAISELVI, S., HARICHANDRAN, G., SEENUVASAKUMARAN, P., HANAFIAH, M.M. and FERNANDEZ, C. 2021. Photoelectrochemical applications of electrochemical deposition of Ni2+-doped FeS2 thin films. Journal of materials science: materials in electronics [online], 32(5), pages 6331-6343. Available from: https://doi.org/10.1007/s10854-021-05350-6

• Journal Article Type: Article
• Acceptance Date: Jan 15, 2021
• Online Publication Date: Feb 4, 2021
• Publication Date: Mar 31, 2021
• Deposit Date: Feb 18, 2021
• Publicly Available Date: Feb 5, 2022
• Journal: Journal of Materials Science: Materials in Electronics
• Print ISSN: 0957-4522
• Electronic ISSN: 1573-482X
• Publisher: Springer
• Peer Reviewed: Peer Reviewed
• Volume: 32
• Issue: 5
• Pages: 6331-6343
• DOI: https://doi.org/10.1007/s10854-021-05350-6
• Keywords: Photoelectrochemical; ECD technique; Ion-doped; Iron pyrite; Semiconductor thin films; Crystalline nature; Photocurrent; Electrocatalytic active
• Public URL: https://rgu-repository.worktribe.com/output/1205728