AI safety of film capacitors.

Zhang, Yong-Xin; Chen, Fang-Yi; Liu, Di-Fan; Wang, Jian-Xiao; Feng, Qi-Kun; Jiang, Hai-Yang; Wang, Xin-Jie; Zhao, Hong-Bo; Zhong, Shao-Long; Shah, Faisal Mehmood; Dang, Zhi-Min

Abstract

With a large number of film capacitors being deployed in critical locations in electrical and electronic systems, artificial intelligence (AI) technology is also expected to address the problems encountered in this process. According to our findings, AI applications can cover the entire lifecycle of film capacitors. However, the AI safety hazards in these applications have not received the attention they deserve. To meet this, the authors argue, with specific examples, risks that flawed, erratic, and unethical AI can introduce in the design, operation, and evaluation of film capacitors. Human-AI common impact and more multi-dimensional evaluation for AI are proposed to better cope with unknown, ambiguity, and known risks brought from AI in film capacitors now and in the future.

Citation

ZHANG, Y.-X., CHEN, F.-Y., LIU, D.-F., WANG, J.-X., FENG, Q.-K., JIANG, H.-Y., WANG, X.-J., ZHAO, H.-B., ZHONG, S.-L., SHAH, F.M. and DANG, Z.-M. [2024]. AI safety of film capacitors. IET nanodielectrics [online], Early View. Available from: https://doi.org/10.1049/nde2.12071

• Journal Article Type: Article
• Acceptance Date: Oct 30, 2023
• Online Publication Date: Nov 16, 2023
• Deposit Date: May 6, 2024
• Publicly Available Date: May 8, 2024
• Journal: IET nanodielectrics
• Electronic ISSN: 2514-3255
• Publisher: Wiley Open Access
• Peer Reviewed: Peer Reviewed
• DOI: https://doi.org/10.1049/nde2.12071
• Keywords: Film capacitors; Capacitors; Dielectic materials; Nanomaterials; Artificial intelligence (AI)
• Public URL: https://rgu-repository.worktribe.com/output/2332323